type
Atomic Layer Afzetting
Video Uitgaande-Inspectie
Verstrekt
Machines Testrapport
Verstrekt
Afmetingen( l* w* h)
customization
Key Selling Punten
Concurrerende Prijs
Product name
Thermal Atomic Layer Deposition System
Application
Microelectronics, nanomaterials, optical films, solar cells
Technology
Atomic Layer Deposition ALD
Sample table size
8 inch and below
Substrate heating temperature
RT-400℃; ±1 ℃
Number of precursors
3,optional more lines
Precursor source pipeline temperature
RT-200 ℃; ±1 ℃
Source container temperature
RT-200 ℃; ±1 ℃
Background vacuum
<5*10-3Torr
Growing mode
Consecutive or interval deposition mode
